Growth studies and characterisation of In 2 S 3 thin films deposited by atomic layer deposition (ALD)

Author： Naghavi N. Henriquez R. Laptev V. Lincot D.

Publisher： Elsevier

ISSN： 0169-4332

Source： Applied Surface Science, Vol.222, Iss.1, 2004-01, pp. : 65-73

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