Related content

Optical emission study of CH 4 +CHF 3 ECR plasma and properties of a-C:F:H films

By Xin Y.   Ning Z.Y.   Ye C.   Lu X.H.   Xiang S.L.   Du W.   Huang S.   Chen J.   Cheng S.H.  

Surface and Coatings Technology, Vol. 173, Iss. 2, 2003-08 ,pp. : 172-177

Elsevier

Access to resources Recommend Favorite

Crystallinity of Al 2 O 3 films deposited by metalorganic chemical vapor deposition

By Pradhan S.K.   Reucroft P.J.   Ko Y.  

Surface and Coatings Technology, Vol. 176, Iss. 3, 2004-01 ,pp. : 382-384

Elsevier

Access to resources Recommend Favorite

Ti-B and Ti-B-C coatings deposited by plasma immersion ion implantation and their fretting behavior

By Prakash B.   Richter E.   Pattyn H.   Celis J.P.  

Surface and Coatings Technology, Vol. 173, Iss. 2, 2003-08 ,pp. : 150-160

Elsevier

Access to resources Recommend Favorite

Influence of O 2 admixture and sputtering pressure on the properties of ITO thin films deposited on PET substrate using RF reactive magnetron sputtering

By Kim Y.-S.   Park Y.-C.   Ansari S.G.   Lee J.-Y.   Lee B.-S.   Shin H.-S.  

Surface and Coatings Technology, Vol. 173, Iss. 2, 2003-08 ,pp. : 299-308

Elsevier

Access to resources Recommend Favorite

The Change from Respelling to IPA in English Dictionaries: Increase in Accuracy or Increase in Prescriptivism?

By H鋍ker Martina  

Language & History, Vol. 55, Iss. 1, 2012-05 ,pp. : 47-62

Maney Publishing

Access to resources Recommend Favorite