Crystallization induced by thermal annealing with millisecond pulses in silicon-on-insulator films implanted with high doses of hydrogen ions

Author： Tyschenko I. Volodin V. Voelskow M. Cherkov A. Popov V.

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7826

Source： Semiconductors, Vol.47, Iss.5, 2013-05, pp. : 606-611

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