He and H sequential implantation induced surface blistering and the exfoliation of Si covered with an oxide layer

Author: Zhuo Wang   Yu-Jie Gao   Meng-Kai Li   Fei Zhu   Da-Cheng Zhang   Chang-Long Liu  

Publisher: IOP Publishing

ISSN: 1674-1137

Source: Chinese Physics C, Vol.37, Iss.1, 2013-01, pp. : 16001-16006

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Abstract