Surface-discharge characteristics of MgO-thin films prepared by reactive RF unbalanced magnetron sputtering

By Park C.-H.   Kim Y.-K.   Lee S.-H.   Lee W.-G.   Sung Y.-M.  

Thin Solid Films, Vol. 366, Iss. 1, 2000-05 ,pp. : 88-94

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Properties of aluminium oxide thin films deposited by reactive magnetron sputtering

By Koski K.   Holsa J.   Juliet P.  

Thin Solid Films, Vol. 339, Iss. 1, 1999-02 ,pp. : 240-248

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Copper nitride thin films prepared by reactive radio-frequency magnetron sputtering

By Nosaka T.   Yoshitake M.   Okamoto A.   Ogawa S.   Nakayama Y.  

Thin Solid Films, Vol. 348, Iss. 1, 1999-07 ,pp. : 8-13

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Nanostructure of ZnO thin films prepared by reactive rf magnetron sputtering

By Takai O.   Futsuhara M.   Shimizu G.   Lungu C.P.   Nozue J.  

Thin Solid Films, Vol. 318, Iss. 1, 1998-04 ,pp. : 117-119

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Growth and nanostructure of InN thin films deposited by reactive magnetron sputtering

By Takai O.   Ikuta K.   Inoue Y.  

Thin Solid Films, Vol. 318, Iss. 1, 1998-04 ,pp. : 148-150

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