Polycrystalline silicon films prepared by metal-induced crystallisation using pre- and post-deposited aluminium on amorphous silicon

Author： Adhikary Koel Ray Swati

Publisher： Taylor & Francis Ltd

ISSN： 1478-6443

Source： Philosophical Magazine, Vol.92, Iss.33, 2012-11, pp. : 4075-4087

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Metal-induced crystallization of amorphous silicon

By Yoon S.Y. Park S.J. Kim K.H. Jang J.

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 34-38

Elsevier

Access to resources Recommend Favorite

Preparation of thin polycrystalline silicon films on glass by aluminium-induced crystallisation-an electron microscopy study

By Sieber I. Schneider R. Doerfel I. Schubert-Bischoff P. Gall S. Fuhs W.

Thin Solid Films, Vol. 427, Iss. 1, 2003-03 ,pp. : 298-302

Elsevier

Access to resources Recommend Favorite

Polycrystalline silicon prepared by metal induced crystallization

By Choi J.H. Kim D.Y. Kim S.S. Park S.J. Jang J.

Thin Solid Films, Vol. 440, Iss. 1, 2003-09 ,pp. : 1-4

Elsevier

Access to resources Recommend Favorite

Properties of amorphous silicon carbide films prepared by PECVD

By Huran J. Hrubcin L. Kobzev A.P. Liday J.

Vacuum, Vol. 47, Iss. 10, 1996-10 ,pp. : 1223-1225

Elsevier

Access to resources Recommend Favorite

Oxidation processes in hydrogenated amorphous silicon nitride films deposited by ArF laser-induced CVD at low temperatures

By Banerji N. Serra J. Gonzalez P. Chiussi S. Parada E. Leon B. Perez-Amor M.

Thin Solid Films, Vol. 317, Iss. 1, 1998-04 ,pp. : 214-218

Elsevier

Access to resources Recommend Favorite