Physicochemical properties of SiC-based ceramics deposited by low pressure chemical vapor deposition from CH 3 SiCl 3 -H 2

Author: Loumagne F.   Langlais F.   Naslain R.   Schamm S.   Dorignac D.   Sevely J.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.254, Iss.1, 1995-01, pp. : 75-82

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Abstract