Study of thin SiO 2 and its interface formed by thermal oxidation of rf hydrogen plasma-cleaned silicon

By Szekeres A.   Paneva A.   Alexandrova S.  

Vacuum, Vol. 61, Iss. 2, 2001-05 ,pp. : 263-268

Elsevier

Access to resources Recommend Favorite

Synthesis of SiO 2 and SiO x C y H z thin films by microwave plasma CVD

By Barranco A.   Cotrino J.   Yubero F.   Espinos J.P.   Bentez J.   Clerc C.   Gonzalez-Elipe A.R.  

Thin Solid Films, Vol. 401, Iss. 1, 2001-12 ,pp. : 150-158

Elsevier

Access to resources Recommend Favorite

Growth and Structure of Picene Thin Films on SiO₂

By Kurihara R.   Hosokai T.   Kubozono Y.  

Molecular Crystals and Liquid Crystals, Vol. 580, Iss. 1, 2013-09 ,pp. : 83-87

Taylor & Francis Ltd

Access to resources Recommend Favorite

Influence of vacuum rapid thermal annealing on the properties of PCVD SiO 2 and SiO 2 .P 2 O 5 films

By Dimitrov D.B.   Beshkova M.   Dafinova R.  

Vacuum, Vol. 58, Iss. 2, 2000-08 ,pp. : 485-489

Elsevier

Access to resources Recommend Favorite

Rapid thermal annealing effects on plasma deposited SiO x :H films

By San Andres E.   del Prado A.   Martil I.   Gonzalez Daz G.   Martinez F.L.   Bravo D.   Lopez F.J.  

Vacuum, Vol. 67, Iss. 3, 2002-09 ,pp. : 531-536

Elsevier

Access to resources Recommend Favorite