In-situ measurement of gas-phase reactions during the metal-organic chemical vapor deposition of copper using Fourier-transform infrared spectroscopy

By Hanaoka K.   Tachibana K.   Ohnishi H.  

Thin Solid Films, Vol. 262, Iss. 1, 1995-06 ,pp. : 209-217

Elsevier

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In-situ monitoring for CVD processes

By Hopfe V.   Sheel D.W.   Spee C.I.M.A.   Tell R.   Martin P.   Beil A.   Pemble M.   Weiss R.   Vogt U.   Graehlert W.  

Thin Solid Films, Vol. 442, Iss. 1, 2003-10 ,pp. : 60-65

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In-situ low temperature cleaning of silicon surfaces using hydrogen atoms

By Crossley A.   Sofield C.J.   Sugden S.   Clampitt R.   Bradley C.  

Vacuum, Vol. 46, Iss. 7, 1995-07 ,pp. : 667-672

Elsevier

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Hot‐wire assisted ALD of tungsten films: In‐situ study of the interplay between CVD, etching, and ALD modes

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PHYSICA STATUS SOLIDI (A) APPLICATIONS AND MATERIALS SCIENCE, Vol. 212, Iss. 7, 2015-07 ,pp. : 1607-1614

John Wiley & Sons Inc

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In-situ ultra-high vacuum studies of electromigration in copper films

By Jo B.H.   Vook R.W.  

Thin Solid Films, Vol. 262, Iss. 1, 1995-06 ,pp. : 129-134

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