In-situ monitoring for CVD processes

Author： Hopfe V.   Sheel D.W.   Spee C.I.M.A.   Tell R.   Martin P.   Beil A.   Pemble M.   Weiss R.   Vogt U.   Graehlert W.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.442, Iss.1, 2003-10, pp. : 60-65

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