Sputter-deposited Mo and reactively sputter-deposited Mo-N films as barrier layers against Cu diffusion

By Chuang J.-C.   Tu S.-L.   Chen M.-C.  

Thin Solid Films, Vol. 346, Iss. 1, 1999-06 ,pp. : 299-306

Elsevier

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Characterisation of magnetron sputter deposited MoS x /metal multilayers

By Simmonds M.C.   Savan A.   Van Swygenhoven H.   Pfluger E.  

Thin Solid Films, Vol. 354, Iss. 1, 1999-10 ,pp. : 59-65

Elsevier

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Effects of sputter-deposited materials (W, Ti and SiC) on interfacial reaction between MoSi 2 and Nb

By Kurokawa K.   Ochiai G.   Takahashi H.   Ohta S.   Takahashi H.  

Vacuum, Vol. 59, Iss. 1, 2000-10 ,pp. : 284-291

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Characterization of sputter-deposited WO 3 and CeO 2-x -TiO 2 thin films for electrochromic applications

By Janke N.   Bieberle A.   Weiszmann R.  

Thin Solid Films, Vol. 392, Iss. 1, 2001-07 ,pp. : 134-141

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Structure of martensite in sputter-deposited Ti–Ni thin films containing homogeneously distributed Ti 2 Ni precipitates

By Zhang J. X.   Sato M.   Ishida A.  

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Taylor & Francis Ltd

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