Structure and composition of (Ti, Al)N films prepared by r.f. planar magnetron sputtering using a composite target

By Inoue S.   Uchida H.   Koterazawa K.   Hioki A.   Howson R.P.  

Thin Solid Films, Vol. 271, Iss. 1, 1995-12 ,pp. : 15-18

Elsevier

Access to resources Recommend Favorite

Effect of substrate composition on the piezoelectric response of reactively sputtered AlN thin films

By Ruffner J.A.   Clem P.G.   Tuttle B.A.   Dimos D.   Gonzales D.M.  

Thin Solid Films, Vol. 354, Iss. 1, 1999-10 ,pp. : 256-261

Elsevier

Access to resources Recommend Favorite

Reactively magnetron sputtered Ti-Al-N thin films with enhanced mechanical properties

By Kourtev J.   Pascova R.  

Vacuum, Vol. 47, Iss. 10, 1996-10 ,pp. : 1197-1201

Elsevier

Access to resources Recommend Favorite

Reactively DC magnetron sputtered thin AlN films studied by X-ray photoelectron spectroscopy and polarised infrared reflection

By Manova D.   Dimitrova V.   Karpuzov D.   Yankov R.  

Vacuum, Vol. 52, Iss. 3, 1999-03 ,pp. : 301-305

Elsevier

Access to resources Recommend Favorite

Low temperature growth of r.f. reactively planar magnetron-sputtered AlN films

By Penza M.   De Riccardis M.F.   Mirenghi L.   Tagliente M.A.   Verona E.  

Thin Solid Films, Vol. 259, Iss. 2, 1995-04 ,pp. : 154-162

Elsevier

Access to resources Recommend Favorite