Surface roughness of oxidised copper films studied by atomic force microscopy and spectroscopic light scattering

By Ronnow D.   Lindstrom T.   Isidorsson J.   Ribbing C.-G.  

Thin Solid Films, Vol. 325, Iss. 1, 1998-07 ,pp. : 92-98

Elsevier

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Comparative study of surface roughness measured on polysilicon using spectroscopic ellipsometry and atomic force microscopy

By Petrik P.   Biro L.P.   Fried M.   Lohner T.   Berger R.   Schneider C.   Gyulai J.   Ryssel H.  

Thin Solid Films, Vol. 315, Iss. 1, 1998-03 ,pp. : 186-191

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Roughness analysis of optical films and substrates by atomic force microscopy

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Erratum to ''Surface roughness of oxidized copper films studied by atomic force microscopy and spectroscopic light scattering'' [Thin Solid Films 325 (1998) 92-98]

By Ronnow D.   Lindstrom T.   Isidorsson J.   Ribbing C.-G.  

Thin Solid Films, Vol. 366, Iss. 1, 2000-05 ,pp. : 306-306

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Atomic force microscopy in the surface characterization of semiconductors and superconductors

By Gonnelli R. S.  

Philosophical Magazine B, Vol. 80, Iss. 4, 2000-04 ,pp. : 599-609

Taylor & Francis Ltd

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