Author： Ley L. Wang Y. Van V.N. Fisson S. Souche D. Vuye G. Rivory J.
Publisher： Elsevier
ISSN： 0040-6090
Source： Thin Solid Films, Vol.270, Iss.1, 1995-12, pp. : 561-566
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Silicide formation in thin film Pt-Si(111) structure by USXES data
By Domashevskaya E.P. Yurakov Y.A. Kashkarov V.M.
Thin Solid Films, Vol. 298, Iss. 1, 1997-04 ,pp. :
Access to resources
Recommend
Formation of ultra-thin PtSi film by vacuum annealing
By Shuang L. Zhiyong Z. Yonggong N. Ai C. Huaiwu Z. Jiade Y.
Vacuum, Vol. 65, Iss. 2, 2002-04 ,pp. :
Deep Oxidation of Methane on a Pt/Si 3 N 4 Catalyst
Theoretical and Experimental Chemistry, Vol. 40, Iss. 4, 2004-07 ,pp. :