Author: Tsai J.-Y. Apte P.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.270, Iss.1, 1995-12, pp. : 589-595
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
By Kittl J.A. Hong Q.Z. Yang H. Yu N. Samavedam S.B. Gribelyuk M.A.
Thin Solid Films, Vol. 332, Iss. 1, 1998-11 ,pp. :
The influence of TiN on cosputtered (Ti+Si) blanket film
Thin Solid Films, Vol. 424, Iss. 2, 2003-01 ,pp. :
Morphological stability of TiSi 2 on polycrystalline silicon
Thin Solid Films, Vol. 293, Iss. 1, 1997-01 ,pp. :
The formation of TiSi 2 by RTA processing
Thin Solid Films, Vol. 298, Iss. 1, 1997-04 ,pp. :