A thickness model for the TiSi 2 /TiN stack in the titanium salicide process module

By Tsai J.-Y.   Apte P.  

Thin Solid Films, Vol. 270, Iss. 1, 1995-12 ,pp. : 589-595

Elsevier

Access to resources Recommend Favorite

TEM analysis of an additional metal-rich component at the C49-C54 transformation in Ti/Si thin films capped with TiN

By Matko I.   Chenevier B.   Chaix-Pluchery O.   Madar R.   La Via F.  

Thin Solid Films, Vol. 408, Iss. 1, 2002-04 ,pp. : 123-127

Elsevier

Access to resources Recommend Favorite

The effect of elevated silicon substrate temperature on TiSi 2 formatio from a Ti film

By Ezoe K.   Yamamoto T.   Ishii K.   Matsumoto S.  

Thin Solid Films, Vol. 369, Iss. 1, 2000-07 ,pp. : 244-247

Elsevier

Access to resources Recommend Favorite

Dependence of the C49-C54 TiSi 2 phase transition temperature on film thickness and Si substrate orientation

By Jeon H.   Yoon G.   Nemanich R.J.  

Thin Solid Films, Vol. 299, Iss. 1, 1997-05 ,pp. : 178-182

Elsevier

Access to resources Recommend Favorite

Origin of the hardness enhancement in superhard nc-TiN/a-Si3N4 and ultrahard nc-TiN/a-Si3N4/TiSi2 nanocomposites

By Veprek S.  

Philosophical Magazine Letters, Vol. 87, Iss. 12, 2007-12 ,pp. : 955-966

Taylor & Francis Ltd

Access to resources Recommend Favorite