Titanium nitride films for barrier applications produced by rapid thermal CVD and subsequent in-situ annealing

Author: Leutenecker R.   Froschle B.   Cao-Minh U.   Ramm P.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.270, Iss.1, 1995-12, pp. : 621-626

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Abstract