Formation of MoSi 2 by rapid thermal annealing in vacuum of CVD - Mo films on silicon substrate

Author： Gesheva K.A.   Ivanova T.   Gogova D.   Beshkov G.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.58, Iss.2, 2000-08, pp. : 502-508

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