Influence of process parameters on diamond film CVD in a surface-wave driven microwave plasma reactor

Author： Moisan M.   Borges C.F.M.   St-Onge L.   Gicquel A.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.274, Iss.1, 1996-03, pp. : 3-17

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