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Springer Publishing Company

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Fabricating high-aspect-ratio sub-diffraction-limit structures on silicon with two-photon photopolymerization and reactive ion etching

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Fabrication of high-aspect-ratio silicon nanostructures using near-field scanning optical lithography and silicon anisotropic wet-etching process

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The performances of silicon solar cell with core–shell p-n junctions of micro-nano pillars fabricated by cesium chloride self-assembly and dry etching

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Influence of Electrochemical Parameters on the Etching of Macropores in Silicon

By Karachevtseva L. A.   Litvinenko O. A.   Stronskaya E. I.  

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