Fabrication of high-aspect-ratio silicon nanopillar arrays with the conventional reactive ion etching technique

Author: Chang Y.-F.   Chou Q.-R.   Lin J.-Y.   Lee C.-H.  

Publisher: Springer Publishing Company

ISSN: 0947-8396

Source: Applied Physics A, Vol.86, Iss.2, 2007-02, pp. : 193-196

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Abstract