Microcrystalline structure of poly-Si films prepared by cathode-type r.f. glow discharge

By Jayatissa A.H.   Nakanishi Y.   Hatanaka Y.   Suzuki M.  

Thin Solid Films, Vol. 256, Iss. 1, 1995-02 ,pp. : 234-239

Elsevier

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Roughness and deposition mechanism of DLC films prepared by r.f. plasma glow discharge

By Ali A.   Hirakuri K.K.   Friedbacher G.  

Vacuum, Vol. 51, Iss. 3, 1998-11 ,pp. : 363-368

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Microstructure of -FeSi 2 thin films prepared by pulsed laser deposition

By Yoshitake T.   Nagamoto T.   Nagayama K.  

Thin Solid Films, Vol. 381, Iss. 2, 2001-01 ,pp. : 236-243

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Microstructural characterization of iron thin films prepared by sputtering at very low temperatures

By Munoz-Martn A.   Vila M.   Prieto C.   Ocal C.   Martnez J.L.  

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Chemical bonding in thin Ge/C films deposited from tetraethylgermanium in an r.f. glow discharge - An FTIR study

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