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The effect of thermal annealing on the properties of thin alumina films prepared by low pressure metal-organic chemical vapour deposition

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Thin Solid Films, Vol. 256, Iss. 1, 1995-02 ,pp. : 8-12

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Metal-organic chemical vapour deposition of thin films of cobalt on different substrates: study of microstructure

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Thin Solid Films, Vol. 413, Iss. 1, 2002-06 ,pp. : 8-15

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The mechanical properties of thin alumina films deposited by metal-organic chemical vapour deposition

By Fransen T.   Haanappel V.A.C.   Van der Vendel D.   Metselaar H.S.C.   Van Corbach H.D.   Gellings P.J.  

Thin Solid Films, Vol. 254, Iss. 1, 1995-01 ,pp. : 153-163

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The use of Ce(fod) 4 as a precursor for the growth of ceria films by metal-organic chemical vapour deposition

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