Improved control techniques for the reactive magnetron sputtering of silicon to produce silicon oxide and the implications for selected film properties

Author： Danson N.   Hall G.W.   Howson R.P.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.289, Iss.1, 1996-11, pp. : 99-106

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