Growth control and properties of microcrystallized silicon films deposited by hydrogen plasma sputtering

Author: Achiq A.   Rizk R.   Madelon R.   Gourbilleau F.   Voivenel P.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.296, Iss.1, 1997-03, pp. : 15-18

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Abstract