Surface-discharge characteristics of MgO-thin films prepared by reactive RF unbalanced magnetron sputtering

By Park C.-H.   Kim Y.-K.   Lee S.-H.   Lee W.-G.   Sung Y.-M.  

Thin Solid Films, Vol. 366, Iss. 1, 2000-05 ,pp. : 88-94

Elsevier

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New challenges on gallium-doped zinc oxide films prepared by r.f. magnetron sputtering

By Assuncao V.   Fortunato E.   Marques A.   Goncalves A.   Ferreira I.   Aguas H.   Martins R.  

Thin Solid Films, Vol. 442, Iss. 1, 2003-10 ,pp. : 102-106

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Near-infrared tunable response photodetectors based on amorphous/crystalline silicon heterostructures prepared by the r.f. magnetron sputtering technique

By Budaguan B.G.   Sherchenkov A.A.  

Thin Solid Films, Vol. 299, Iss. 1, 1997-05 ,pp. : 173-177

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Characterization of diamond-like carbon (DLC) thin films prepared by r.f. magnetron sputtering

By Sanchez N.A.   Rincon C.   Zambrano G.   Galindo H.   Prieto P.  

Thin Solid Films, Vol. 373, Iss. 1, 2000-09 ,pp. : 247-250

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Characteristics of zinc oxide thin films prepared by r.f. magnetron-mode electron cyclotron resonance sputtering

By Inukai T.   Matsuoka M.   Ono K.  

Thin Solid Films, Vol. 257, Iss. 1, 1995-02 ,pp. : 22-27

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