Influence of the formation conditions on the microstructure of porous silicon layers studied by spectroscopic ellipsometry

By Rossow U.   Frotscher U.   Thonissen M.   Berger M.G.   Frohnhoff S.   Munder H.   Richter W.  

Thin Solid Films, Vol. 255, Iss. 1, 1995-01 ,pp. : 5-8

Elsevier

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Investigation of different oxidation processes for porous silicon studied by spectroscopic ellipsometry

By Frotscher U.   Rossow U.   Ebert M.   Pietryga C.   Richter W.   Munder H.   Arens-Fischer R.   Berger M.G.  

Thin Solid Films, Vol. 276, Iss. 1, 1996-04 ,pp. : 36-39

Elsevier

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Annealing effects on silicon-rich oxide films studied by spectroscopic ellipsometry

By Spiga S.   Tallarida G.   Borghesi A.   Sassella A.   De Santi G.  

Thin Solid Films, Vol. 325, Iss. 1, 1998-07 ,pp. : 36-41

Elsevier

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Determination of the thickness of thin silane films on aluminium surfaces by means of spectroscopic ellipsometry

By Franquet A.   De Laet J.   Schram T.   Terryn H.   Subramanian V.   van Ooij W.J.   Vereecken J.  

Thin Solid Films, Vol. 384, Iss. 1, 2001-03 ,pp. : 37-45

Elsevier

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Spectroscopic ellipsometry investigation of V 2 O 5 nanocrystalline thin films

By Losurdo M.   Barreca D.   Bruno G.   Tondello E.  

Thin Solid Films, Vol. 384, Iss. 1, 2001-03 ,pp. : 58-64

Elsevier

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