Formation of high-quality silicon dioxide films by electron cyclotron resonance plasma oxidation and plasma-enhanced chemical vapour deposition

Author： Landheer D. Hulse J.E. Quance T.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.293, Iss.1, 1997-01, pp. : 52-62

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