Electrical properties of silicon nitride films grown on a SiGe layer by distributed electron cyclotron resonance plasma-enhanced chemical vapor deposition

Author： Dufour-Gergam E.   Meyer F.   Delmotte F.   Hugon M.C.   Agius B.   Dutartre D.   Warren P.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.294, Iss.1, 1997-02, pp. : 214-216

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