Low temperature zirconia thin film synthesis by a chemical vapour deposition process involving ZrCl 4 and O 2 -H 2 -Ar microwave post-discharges. Comparison with a conventional CVD hydrolysis process

Author： Gavillet J.   Belmonte T.   Hertz D.   Michel H.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.301, Iss.1, 1997-06, pp. : 35-44

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Dust particle formation in low pressure Ar/CH 4 and Ar/C 2 H 2 discharges used for thin film deposition

By Berndt J.   Hong S.   Kovacevic E.   Stefanovic I.   Winter J.  

Vacuum, Vol. 71, Iss. 3, 2003-05 ,pp. : 377-390

Elsevier

Access to resources Recommend Favorite

Ar stabilisation of the cubic/tetragonal phases of ZrO 2 in thin films prepared by ion beam induced chemical vapour deposition

By Holgado J.P.   Espinos J.P.   Yubero F.   Justo A.   Ocana M.   Bentez J.   Gonzalez-Elipe A.R.  

Thin Solid Films, Vol. 389, Iss. 1, 2001-06 ,pp. : 34-42

Elsevier

Access to resources Recommend Favorite

Effect of N 2 O/SiH 4 ratio on the properties of low-temperature silicon oxide films from remote plasma chemical vapour deposition

By Rhee S.-W.   Park Y.-B.   Kang J.-K.  

Thin Solid Films, Vol. 280, Iss. 1, 1996-07 ,pp. : 43-50

Elsevier

Access to resources Recommend Favorite

Optical properties of SnO 2 thin films grown by atmospheric pressure chemical vapour deposition oxidizing SnCl 4

By Davazoglou D.  

Thin Solid Films, Vol. 302, Iss. 1, 1997-06 ,pp. : 204-213

Elsevier

Access to resources Recommend Favorite

Low-temperature growth of SnO2 film prepared by XeCl excimer laser MOD process

By Tsuchiya T.   Takeda M.   Yamaguchi I.   Manabe T.   Kumagai T.   Mizuta S.  

Applied Physics A, Vol. 79, Iss. 4-6, 2004-09 ,pp. : 1541-1544

Springer Publishing Company

Access to resources Recommend Favorite