Dust particle formation in low pressure Ar/CH 4 and Ar/C 2 H 2 discharges used for thin film deposition

Author: Berndt J.   Hong S.   Kovacevic E.   Stefanovic I.   Winter J.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.71, Iss.3, 2003-05, pp. : 377-390

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract