Deposition of low temperature Si-based insulators by the electron cyclotron resonance plasma method

By Garcia S.   Martin J.M.   Martil I.   Fernandez M.   Gonzalez-Diaz G.  

Thin Solid Films, Vol. 317, Iss. 1, 1998-04 ,pp. : 116-119

Elsevier

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SiCN alloys obtained by remote plasma chemical vapour deposition from novel precursors

By Smirnova T.P.   Badalian A.M.   Yakovkina L.V.   Kaichev V.V.   Bukhtiyarov V.I.   Shmakov A.N.   Asanov I.P.   Rachlin V.I.   Fomina A.N.  

Thin Solid Films, Vol. 429, Iss. 1, 2003-04 ,pp. : 144-151

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Structure and mechanical properties of hard amorphous carbon-nitrogen films obtained by plasma decomposition of methane-ammonia mixtures

By Freire F.L.J.   Franceschini D.F.  

Thin Solid Films, Vol. 293, Iss. 1, 1997-01 ,pp. : 236-243

Elsevier

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Effect of N 2 O/SiH 4 ratio on the properties of low-temperature silicon oxide films from remote plasma chemical vapour deposition

By Rhee S.-W.   Park Y.-B.   Kang J.-K.  

Thin Solid Films, Vol. 280, Iss. 1, 1996-07 ,pp. : 43-50

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Carbon nitride CN x film deposition assisted by IR laser ablation in a cold remote nitrogen plasma

By Jama C.   Rousseau V.   Dessaux O.   Goudmand P.  

Thin Solid Films, Vol. 302, Iss. 1, 1997-06 ,pp. : 58-65

Elsevier

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