Preparation of hard and ultra water-repellent silicon oxide films by microwave plasma-enhanced CVD at low substrate temperatures

By Wu Y.   Sugimura H.   Inoue Y.   Takai O.  

Thin Solid Films, Vol. 435, Iss. 1, 2003-07 ,pp. : 161-164

Elsevier

Access to resources Recommend Favorite

Characteristics of ultra water-repellent thin films prepared by combined process of microwave plasma-enhanced CVD and oxygen-plasma treatment

By Wu Y.   Inoue Y.   Sugimura H.   Takai O.   Kato H.   Murai S.   Oda H.  

Thin Solid Films, Vol. 407, Iss. 1, 2002-03 ,pp. : 45-49

Elsevier

Access to resources Recommend Favorite

Preparation and characterization of amorphous GaF 3 and GaF 3 -BaF 2 thin films by ECR microwave plasma-enhanced CVD

By Takahashi S.   Shojiya M.   Kawamoto Y.   Konishi A.  

Thin Solid Films, Vol. 429, Iss. 1, 2003-04 ,pp. : 28-33

Elsevier

Access to resources Recommend Favorite

Water-repellency of a-C:H films deposited by rf plasma-enhanced CVD

By Kim J.-D.   Sugimura H.   Takai O.  

Vacuum, Vol. 66, Iss. 3, 2002-08 ,pp. : 379-383

Elsevier

Access to resources Recommend Favorite

Properties of silicon oxide films deposited by plasma-enhanced CVD using organosilicon reactants and mass analysis in plasma

By Inoue Y.   Takai O.  

Thin Solid Films, Vol. 341, Iss. 1, 1999-03 ,pp. : 47-51

Elsevier

Access to resources Recommend Favorite