Plasma etching and patterning of CVD diamond at < 100 o C for microelectronics applications

Author: Ramesham R.   Welch W.   Neely W.C.   Rose M.F.   Askew R.F.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.304, Iss.1, 1997-07, pp. : 245-251

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Abstract