Residual stress in silicon films deposited by LPCVD from disilane

Author: Temple-Boyer P.   Scheid E.   Faugere G.   Rousset B.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.310, Iss.1, 1997-11, pp. : 234-237

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Abstract