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Thin Solid Films, Vol. 317, Iss. 1, 1998-04 ,pp. : 112-115

Elsevier

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Residual stress in silicon films deposited by LPCVD from disilane

By Temple-Boyer P.   Scheid E.   Faugere G.   Rousset B.  

Thin Solid Films, Vol. 310, Iss. 1, 1997-11 ,pp. : 234-237

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Preparation of silicon-carbon alloy films by hot-wire CVD and their properties

By Itoh T.   Katoh Y.   Fujiwara T.   Fukunaga K.   Nonomura S.   Nitta S.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 240-243

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Erratum to ''Quantitative analysis of tungsten, oxygen and carbon concentrations in the microcrystalline silicon films deposited by hot-wire CVD'' - [Thin Solid Films 430 (2003) 110-115]

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Properties of nitrogen doped silicon films deposited by low pressure chemical vapour deposition from disilane and ammonia

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Thin Solid Films, Vol. 414, Iss. 1, 2002-07 ,pp. : 13-17

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