Preparation of argon-free refractory thin films using RF-DC coupled magnetron sputtering

By Petrov P.K.   Hollmann E.K.   Volpyas V.A.   Volpyas A.V.   Tanaka T.   Kawabata K.  

Vacuum, Vol. 53, Iss. 1, 1999-05 ,pp. : 37-39

Elsevier

Access to resources Recommend Favorite

Monte Carlo simulation of argon atoms transport during deposition of W thin films by RF-dc coupled magnetron sputtering

By Petrov P.K.   Volpyas V.A.   Hollmann E.K.   Kawabata K.   Tanaka T.  

Vacuum, Vol. 48, Iss. 7, 1997-09 ,pp. : 669-670

Elsevier

Access to resources Recommend Favorite

Effect of d.c. bias on the deposition rate using r.f.-d.c. coupled magnetron sputtering for SnN x thin films

By Kamei R.   Migita T.   Tanaka T.   Kawabata K.  

Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. : 764-770

Elsevier

Access to resources Recommend Favorite

Preparation of TiN x thin films using r.f.-d.c. coupled magnetron sputtering in Ar-N 2 gas plasma

By Tanaka T.   Kawabata K.  

Thin Solid Films, Vol. 317, Iss. 1, 1998-04 ,pp. : 93-95

Elsevier

Access to resources Recommend Favorite

Structure and composition of (Ti, Al)N films prepared by r.f. planar magnetron sputtering using a composite target

By Inoue S.   Uchida H.   Koterazawa K.   Hioki A.   Howson R.P.  

Thin Solid Films, Vol. 271, Iss. 1, 1995-12 ,pp. : 15-18

Elsevier

Access to resources Recommend Favorite