Stability of plasma-deposited amorphous hydrogenated boron films

By Jacob W.   Annen A.   Sasz M.   Beckmann R.  

Thin Solid Films, Vol. 300, Iss. 1, 1997-05 ,pp. : 101-106

Elsevier

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Influence of the process parameters on the properties of hydrogenated amorphous carbon thin films deposited using ECR plasma

By Piazza F.   Arnal Y.   Grambole D.   Herrmann F.   Kildemo M.   Lacoste A.   Relihan G.   Golanski A.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 196-199

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Optical characterization of hydrogenated amorphous carbon (a-C:H) thin films deposited from methane plasma

By Hong J.   Goullet A.   Turban G.  

Thin Solid Films, Vol. 364, Iss. 1, 2000-03 ,pp. : 144-149

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Optical absorption of amorphous hydrogenated carbon thin films

By Meissner D.   Helmbold A.  

Thin Solid Films, Vol. 283, Iss. 1, 1996-09 ,pp. : 196-203

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Stress reduction for hard amorphous hydrogenated carbon thin films deposited by the self-bias method

By Yamada H.   Tsuji O.   Wood P.  

Thin Solid Films, Vol. 270, Iss. 1, 1995-12 ,pp. : 220-225

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