Formation of 'environmentally friendly' semiconductor ( -FeSi 2 ) thin films prepared by ion beam sputter deposition (IBSD) method

By Sasase M.   Nakanoya T.   Yamamoto H.   Hojou K.  

Thin Solid Films, Vol. 401, Iss. 1, 2001-12 ,pp. : 73-76

Elsevier

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Structure and composition studies for silicon nitride thin films deposited by single ion bean sputter deposition

By Huang L.   Hipps K.W.   Dickinson J.T.   Mazur U.   Wang X.D.  

Thin Solid Films, Vol. 299, Iss. 1, 1997-05 ,pp. : 104-109

Elsevier

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Epitaxial stabilization of single crystal anatase films via reactive sputter deposition

By Jeong B.-S.   Budai J.D.   Norton D.P.  

Thin Solid Films, Vol. 422, Iss. 1, 2002-12 ,pp. : 166-169

Elsevier

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Monte Carlo simulations of sputter deposition and step coverage of thin films

By Coronell D.G.   Egan E.W.   Hamilton G.   Jain A.   Venkatraman R.   Weitzman B.  

Thin Solid Films, Vol. 333, Iss. 1, 1998-11 ,pp. : 77-81

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Degradation during sputter deposition of solid electrolyte thin films for microsystems

By Seguin J.-L.   Lambert-Mauriat C.   Aguir K.   Bendahan M.   Jacolin C.   Lauque P.  

Thin Solid Films, Vol. 422, Iss. 1, 2002-12 ,pp. : 87-91

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