Dependence of the physical properties of SiN x :H films deposited by the ECR plasma method on the discharge size

Author： Garcia S.   Martin J.M.   Martil I.   Gonzalez-Diaz G.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.315, Iss.1, 1998-03, pp. : 22-28

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