Dependence of the physical properties of SiN x :H films deposited by the ECR plasma method on the discharge size

By Garcia S.   Martin J.M.   Martil I.   Gonzalez-Diaz G.  

Thin Solid Films, Vol. 315, Iss. 1, 1998-03 ,pp. : 22-28

Elsevier

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Model and computer simulation results of defect transformation and decomposition of SiN x :H films during high temperature treatment

By Gadiyak G.V.   Gadiyak V.G.   Kosinova M.L.   Salman E.G.  

Thin Solid Films, Vol. 335, Iss. 1, 1998-11 ,pp. : 19-26

Elsevier

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Effect of vacuum rapid thermal annealing on the properties of SiN x films

By Beshkov G.   Dimitrov D.B.   Velchev N.   Petrov P.   Ivanov B.   Zambov L.   Dimitrova T.  

Vacuum, Vol. 58, Iss. 2, 2000-08 ,pp. : 509-515

Elsevier

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Moisture-resistant properties of SiN x films prepared by PECVD

By Lin H.   Xu L.   Chen X.   Wang X.   Sheng M.   Stubhan F.   Merkel K.-H.   Wilde J.  

Thin Solid Films, Vol. 333, Iss. 1, 1998-11 ,pp. : 71-76

Elsevier

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Preparation of SiN x and composite SiN x -TiN films from alkoxide solutions by liquid injection plasma CVD

By Shimada S.   Tsukurimichi K.  

Thin Solid Films, Vol. 419, Iss. 1, 2002-11 ,pp. : 54-59

Elsevier

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