Author: Fan X. Ishigaki T.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.316, Iss.1, 1998-03, pp. : 174-177
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Plasma diagnostic of an RF magnetron Ar/N 2 discharge
By Fritsche B. Chevolleau T. Kourtev J. Kolitsch A. Moller W.
Vacuum, Vol. 69, Iss. 1, 2002-12 ,pp. :
The nature of ion milling damage in MoSi 2
By Boldt P. Weatherly G.C. Embury J.D.
Philosophical Magazine Letters, Vol. 75, Iss. 2, 1997-02 ,pp. :