Interelectrode separation effects on a-SiGe:H films prepared by plasma chemical vapor deposition

Author： Sali J.V. Rashad A. Marathe B.R. Takwale M.G. Gangurde K.D. Shaligram A.D.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.322, Iss.1, 1998-06, pp. : 1-5

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