Narrow gap a-SiGe:H grown by hot-wire chemical vapor deposition

By Nelson B.P.   Xu Y.   Williamson D.L.   Han D.   Braunstein R.   Boshta M.   Alavi B.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 104-109

Elsevier

Access to resources Recommend Favorite

Interelectrode separation effects on a-SiGe:H films prepared by plasma chemical vapor deposition

By Sali J.V.   Rashad A.   Marathe B.R.   Takwale M.G.   Gangurde K.D.   Shaligram A.D.  

Thin Solid Films, Vol. 322, Iss. 1, 1998-06 ,pp. : 1-5

Elsevier

Access to resources Recommend Favorite

Hot-wire chemical vapor deposition of carbon nanotubes

By Dillon A.C.   Mahan A.H.   Alleman J.L.   Heben M.J.   Parilla P.A.   Jones K.M.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 292-295

Elsevier

Access to resources Recommend Favorite

Development of a hot-wire chemical vapor deposition n-type emitter on p-type crystalline Si-based solar cells

By Wang Q.   Page M.R.   Xu Y.   Iwaniczko E.   Williams E.   Wang T.H.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 208-211

Elsevier

Access to resources Recommend Favorite

Deposition of hydrogenated amorphous silicon (a-Si:H) films by hot wire chemical vapor deposition: role of filament temperature

By Jadkar S.R.   Sali J.V.   Kshrisagar S.T.   Takwale M.G.  

Thin Solid Films, Vol. 437, Iss. 1, 2003-08 ,pp. : 18-24

Elsevier

Access to resources Recommend Favorite