Influence of the power and pressure on the growth rate and refractive index of a-C:H thin films deposited by r.f. plasma-enhanced chemical vapour deposition

By Benmassaoud A.A.   Paynter R.W.  

Thin Solid Films, Vol. 287, Iss. 1, 1996-10 ,pp. : 125-129

Elsevier

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Synthesis of Sn-doped a-C:H films by RF plasma-enhanced chemical vapor deposition and their characterization

By Inoue Y.   Komoguchi T.   Nakata H.   Takai O.  

Thin Solid Films, Vol. 322, Iss. 1, 1998-06 ,pp. : 41-45

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Mechanical properties of a-C:H and a-C:H/SiO x nanocomposite thin films prepared by ion-assisted plasma-enhanced chemical vapor deposition

By Lee Y.H.   Lee J.H.   Kim D.S.   Farouk B.  

Thin Solid Films, Vol. 280, Iss. 1, 1996-07 ,pp. : 204-210

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Growth and microhardness of SiC films by plasma-enhanced chemical vapor deposition

By Seo J.-Y.   Yoon S.-Y.   Niihara K.   Kim K.H.  

Thin Solid Films, Vol. 406, Iss. 1, 2002-03 ,pp. : 138-144

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a-SiC x :H films deposited by plasma-enhanced chemical vapor deposition at low temperature used for moisture and corrosion resistant applications

By Jiang L.   Chen X.   Wang X.   Xu L.   Stubhan F.   Merkel K.-H.  

Thin Solid Films, Vol. 352, Iss. 1, 1999-09 ,pp. : 97-101

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