Influence of the power and pressure on the growth rate and refractive index of a-C:H thin films deposited by r.f. plasma-enhanced chemical vapour deposition

Author： Benmassaoud A.A.   Paynter R.W.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.287, Iss.1, 1996-10, pp. : 125-129

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