Gate-oxide integrity in metal-oxide-semiconductor structures with Ti-polycide gates for ULSI applications

Author： Ko D.-H.   Lee N.I.   Kim Y.W.   Lee M.Y.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.326, Iss.1, 1998-08, pp. : 56-59

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