TiN hard coating prepared by sputter ion plating system with facing target sputtering source and RF discharge

By Park C.-H.   Sung Y.-M.   Lee W.-G.  

Thin Solid Films, Vol. 312, Iss. 1, 1998-01 ,pp. : 182-189

Elsevier

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The structure of TiN films deposited by arc ion plating

By Matsue T.   Hanabusa T.   Ikeuchi Y.  

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Microstructural modification of TiN deposited by magnetron ion plating: Influence of magnetic field configuration

By Zlatanovic M.   Popovic N.   Bogdanov Z.   Belosevac R.   Kunosic A.   Goncic B.  

Thin Solid Films, Vol. 317, Iss. 1, 1998-04 ,pp. : 463-467

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Electron microscopy characterization of TiN films on Si, grown by d.c. reactive magnetron sputtering

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Ion-assisted low-temperature (=< 150 o C) epitaxial growth of TiN on Cu by reactive magnetron sputter deposition

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