Effect of hydrogen radical exposure on the interfacial and bulk structure of a-Si:H/a-SiNx:H multilayer films

Author: Han G.   Du P.   Shou J.   Zhao D.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.334, Iss.1, 1998-12, pp. : 6-10

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Abstract