Optical and electrical characterization of SiGe layers for vertical sub-100 nm MOS transistors

Author: Zhang X.   Unelind P.   Kleverman M.   Olajos J.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.336, Iss.1, 1998-12, pp. : 323-325

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Abstract